3M™ NanoSHIELD™ Hollow Fiber Series Filter Cartridge, NSP05NH01FK, 10in, 0.005 um, 222/Flat Cap, FEP, 1/Case

3M™ NanoSHIELD™ Hollow Fibre Series filters have been engineered to combine a high level of particle retention with high flow rates and low pressure drop for the most demanding applications in the latest technology node. All 3M™ NanoSHIELD™ hollow fibre series filters are critically cleaned and integrity tested to provide low extractable levels and process repeatability out of the box.

3M™ NanoSHIELD™ Hollow Fibre Series filter cartridges provide up to twice the surface area and higher flow rates when compared to pleated membrane cartridges. This increase to flow and decrease to pressure drop allows a typical 10" 3M™ NanoSHIELD™ Hollow Fibre Series filter cartridge to perform similarly to a 20" conventionally pleated filter cartridge. This significant advantage allows for the use of smaller and less costly filter housings which reduce hold-up volume, filter change-out times, and total cost-of-ownership for the life of the process. In addition, Hollow Fibre Technology offers a membrane that is up to 2 times thicker than flat sheet membranes typically used in the lithography industry which in turn maximizes the depth of filtration and particle removal efficiency.

3M™ NanoSHIELD™ Hollow Fibre Series Cartridge is available in polypropylene, polyethylene and nylon membranes. This provides low metallic/ionic contamination and excellent resistance to many chemicals. Metallic or ionic contaminants can extract from surface modified and improperly manufactured filters, which may reduce shelf life and or change the photo-speed, viscosity, or molecular weight of advanced chemicals. For this reason, all 3M™ NanoSHIELD Hollow Fibre Series filters are critically cleaned and integrity tested to provide low extractable levels and process repeatability out of the box.

The compact design of 3M™ NanoSHIELD™ Hollow Fibre Series filter cartridges make them ideally suited for critical applications requiring low hold-up volume with superior flow rates and high particle retention from 100 nm down to 5 nm.